Photoimaging processes and compositions
CA 1294813 C · Owner: Morton International Inc. · Inventors: Cordes, William Frederick, Iii
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The step-on-wafer process also known as the, step-and-repeat alignment process for the production of, very large scale integration (VLSI) microcircuitry with multi-layer interconnects, is greatly facilitated by incorporating, into at least the first layer of photoresist, a dyestuff which meets certain criteria the chief of which is that it be transparent to radiation to which the photoresist system is sensitive and that it absorb radiation of a wavelength to which the photoresist system is not sensitive. The use of photoresist systems in association with such dyestuffs has additional advantages. For example, the thickness of the photoresist layer deposited on a substrate can be checked …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted January 28, 1992. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended January 28, 2009.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.