Apparatus for preselecting and maintaining a fixed gap between a workpiece and a vacuum seal apparatus in particle beam lithography systems
CA 1294065 C · Owner: Etec Systems, Inc. · Inventors: Young, Lydia J.; Veneklasen, Lee H.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Disclosed is a particle beam lithography system (10) having a workpiece loading/unloading position to one side of a particle beam (32) and beam column (12) where a workpiece (14), to be processed, is placed in a vacuum chuck (100) to eliminate any irregularity or warpage of the workpiece (14). At this same position the workpiece, (14) is oriented and fixed at a preselected distance from a standard by gap setting means (162, 162b). This distance correlates with a preselected gap (G) between a seal apparatus (16) and the workpiece (14) during workpiece processing. The workpiece (14) and chuck (100) are then moved beneath the seal apparatus (16) and beam column (12) for workpiece processing. …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted January 7, 1992. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended January 7, 2009.
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Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.