Photosensitive composition
CA 1288994 C · Owner: Okaya, Takuji · Inventors: Sato, Toshiaki; Yamauchi, Junnosuke; Okaya, Takuji
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The invention provides a photosensitive composition comprising: (a) a vinyl alcohol polymer containing the following structural unit A and having a saponification degree of a vinyl ester unit of not less than 70 mol%: A:, wherein R1, R2 and R3 each represents H or a hydrocarbon group having 1 to 4 carbon atoms; (b) a radically polymerizable ethylenic unsaturated compound; and (c) a, photopolymerization initiator. The composition is capable of forming a material having good flexibility and impact resistance which can maintain sufficient softness but is not subject to breakage even at low temperature and low humidity. Resin plates showing high printing quality can be obtained from the …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted September 17, 1991. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended September 17, 2008.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.