Composite photocatalyst for refractory waste degradation
CA 1287829 C · Owner: Mak, Mark K.S. · Inventors: Langford, Cooper H.; Mak, Mark K.S.; Crouch, Andrew M.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The invention is concerned with a composite photocatalyst for refractory waste treatment comprising, particles of a wide band gap semiconductor material selected from the group consisting of titanium oxide cadmium sulfide and cadmium selenide, the particles being coated with a polymer film capable of absorbing a refractory waste substrate to be treated and comprising a pyridine-containing polymer and a divalent metal porphyrin or metal phthalocyanine-based dye. The dye is molecularly dispersed throughout the film and chemically bonded to the pyridine-containing polymer. Upon mixing of the photocatalyst with the refractory waste substrate and irradiation with light having a wavelength of …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted August 20, 1991. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended August 20, 2008.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.