Procedure for fabricating devices involving dry etching

Abstract From the Canadian patent

Abstract, The present invention relates to a process for fabricating a device comprising the steps of forming a resist mask on a substrate, etching the substrate to form a plurality of etch pits defining a plurality of features by inducing reaction of the substrate with energetic species and completing the device. The redeposition of material on the side walls of the etch pit ocours during the etching. The process includes at least one step chosen from the group of steps consisting of, 1) locally compensating for the effect of the redeposition on the conformation of the sidewall 2) when the redeposition material presents a barrier to isotropic etching in the sukstrate, contacting the …