Lithographic process using mask with small opaque or transparent elements
CA 1285664 C · Owner: Moruzzi, Anne Marie · Inventors: Lin, Burn J.; Rosenbluth, Alan E.; Moruzzi, Anne Marie
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Abstract, A lithographic process having improved image quality by employing a mask that includes a plurality of opaque elements or transparent elements that are smaller than the resolution of the lithography to be employed in order to control the transmittance of the actinic light exposure area.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted July 2, 1991. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended July 2, 2008.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.