Pre-exposure method for increased sensitivity in high contrast resist development
CA 1285418 C · Owner: Owens, Robert A. · Inventors: Lewis, James M.; Owens, Robert A.; Ferguson, Susan A.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A high contrast developing process is described for use after pre-exposure to UV-visible radiation to produce increased sensitivity during lithographic processing of positive resist layers. Compared to samples which have not been subjected to the methods of this invention, sensitivity increases of a factor of 2-4 are to be expected. An additional benefit of low film loss from unexposed resist is obtained. The system disclosed is applicable to lithographic exposures utilizing electrons, photons (eg. UV-visible, x-rays etc.) and, atomic or molecular charged particles. Specifically as, a result of the increased sensitivity higher throughput, during lithographic processing for the fabrication …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted July 2, 1991. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended July 2, 2008.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
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Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.