Method of making a device comprising a patterned aluminum layer

Abstract From the Canadian patent

Abstract, This invention relates to a method of making a device comprising a patterned aluminum layer wherein the, aluminum layer is produced by chemical vapor deposition of an aluminum layer on a substrate. The deposition is facilitated by surface activation prior to deposition. Surface activation is at relatively low temperature and results in a hydrated surface; low temperature surface activation is advantageous in the interest of keeping deposition apparatus free of additional chemicals and, substrates activated in this manner may be stored for considerable lengths of time prior to aluminum deposition. i Among suitable activating agents are organochromium organosilane, and …