Photo-curable composition
CA 1280119 C · Owner: Takimoto, Yasuyuki · Inventors: Kimoto, Koichi; Takimoto, Yasuyuki; Kawabata, Masami
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The invention provides a photo-curable composition having a high photosensitivity which comprises a photopolymerizable monomer and, as a photopolymerization initiation system, a mixture of an aromatic ketone and an amine. At least a portion of the monomer and/or the amine is an amine having an acryloyl or methacryloyl group. The composition has good light sensitivity and is resistant to the harmful effects of oxygen.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted February 12, 1991. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended February 12, 2008.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.