Solvents for photoresist removal
CA 1279561 C · Owner: Merrem, Hans-Joachim · Inventors: Merrem, Hans-Joachim; Schmitt, Axel
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The invention relates to solvent systems which are based on water-soluble amino derivatives and propylene glycol components, for removing photoresists. These solvent systems are comprised of, (a) from about 10 to 100% by weight of at least one water-soluble amine of the general formula in which, R1, R2, R3, R4 denote H or alkyl groups n,m denote 0 to 2, and, o denotes 1 to 3; and (b) from about 0 to 90% by weight of at least one water-soluble propylene glycol derivative of the general formula, in which R3, R4 denote H alkyl or C-alkyl, and, P denotes 1 to 3.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted January 29, 1991. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended January 29, 2008.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.