Positive photoresist compositions having deep uv response, photosensitive elements and thermally stable photochemically imaged systems containing same
CA 1279218 C · Owner: Hopf, Frederick R. · Inventors: Mcfarland, Michael J.; Hopf, Frederick R.; Osuch, Christopher E.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
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Actinic (deep ultraviolet, ultraviolet and visible light) sensitive positive photoresist compositions containing a mixture of an alkali-insoluble photoactive compound capable of being transformed into an alkalisoluble species upon exposure to actinic radiation in, an amount sufficient to render the mixture relatively alkali insoluble and a polymer comprising an amount of ?CO-NH-CO? groups, such as maleimide and especially maleimide - substituted styrene copolymers sufficient, to render the mixture readily alkali soluble upon exposure to actinic radiation are disclosed. The preferred copolymers include maleimide/styrene or .alpha.-methylstyrene in a 1:1 molar ratio. The preferred photoactive …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted January 22, 1991. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended January 22, 2008.
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Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.