Downstream etching of substrates separated from plasma
CA 1278767 C · Owner: Flamm, Daniel Lawrence · Inventors: Mayer, Edward Harry; Cook, Joel Malcolm; Seiler, Bernard Carl
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The present invention relates to a process for fabricating a device. The process includes the procedure of removing material from a plurality of substrates. The process comprises the steps of producing reactive species in a plasma and directing the species to the substrates and subsequently into an effluent wherein the substrates are disjoint from and not surrounded by the plasma. The process is characterized in that the volume of the plasma is at least 200 percent a large as the volume occupied by the substrates and the concentration of the reactive species measured in the effluent in the absence of the substrate is at least 25 percent of the concentration of the species at the periphery …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted January 8, 1991. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended January 8, 2008.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.