Intense laser irradiation using reflective optics
CA 1278608 C · Owner: Piwczyk, Bernhard · Inventors: Piwczyk, Bernhard
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Abstract of the Disclosure, Intense far-ultraviolet laser radiation is applied to a workpiece in performance of processes in the fabrication of integrated circuits, including processes of ablation deposition, impurity implantation and radiation induced chemical processes, or other processes where intense far-ultraviolet laser radiation is applied include hardening, and annealing a workpiece by exposure to the radiation. Particular embodiments of the invention herein enables selective removal of a polymer film on a semiconductor substrate by ablative photodecomposition (APD) using intense far-ultraviolet, or shorter wave length radiation from a, pulsed laser requires focusing the laser …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted January 2, 1991. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended January 2, 2008.
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Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.