Deep-uv lithography
CA 1269765 C · Owner: Bruning, John H. · Inventors: Bruning, John H.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The present invention relates to a method and apparatus for defining fine-line features on a wafer. The method comprises the steps of generating narrow-bandwidth laser pulses and directing the pulses via a lens and scanning assembly to form a variable-size variable-shape virtual source composed of the multiple pulses. The method further includes relaying the virtual source through a reticle pattern to illuminate a substantial portion of the entrance pupil of a diffraction-limited low-loss projection lens made of a single optical material, and directing the reticle pattern via the projection lens onto the surface of the wafer. The apparatus comprises a laser that inherently is characterized …
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted May 29, 1990. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended May 29, 2007.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.