Light-sensitive composition for the preparation of a positive-acting photoresist
CA 1267559 C · Owner: Hoechst Celanese Corporation · Inventors: Mammato, Donald; Durham, Dana; Jain, Sangya
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A light-sensitive composition for the preparation of a positive acting photoresist which is a mixture of an alkali soluble resin and a light-sensitive component said light-, sensitive component consisting essentially of a compound of the formula, wherein X is a naphthoquinone-(1,2)-diazide-(2)-sulfonyl residue.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted April 10, 1990. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended April 10, 2007.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.