Further process for the manufacture of resorcinol ethers

Abstract From the Canadian patent

Further process for the manufacture of resorcinol ethers Abstract, Novel 4-acylresorcinol ethers of the formula (I), in which R1 is lower alkyl, alk is a hydroxyalkylene radical which can be interrupted by oxygen and R2 is 5-tetrazolyl,it being possible for the ring A to be additionally substituted by lower alkyl lower alkenyl, lower alkynyl, lower alkoxy and/or halogen and for the ring B to be additionally substituted by lower alkyl lower, alkanoyl, lower alkoxy, lower alkoxycarbonyl carboxyl, cyano, carbamyl, halogen and/or trifluoromethyl and salts, thereof have antiallergic properties and can be used as active compounds for medicaments. They are prepared by methods known as per se.