Photosensitive film based on silicon-containing polymer and its use as a making resin in a lithography process
CA 1264890 C · Owner: Rosilio, Charles · Inventors: Schue, Francois; Rosilio, Charles; Giral, Louis
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Photosensitive film usable more particularly in microlithography for producing electronic components. The film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The siliconcontaining polymer-based photosensitive film can be used as a masking resin in a lithography process. B 8393.3
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted January 23, 1990. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended January 23, 2007.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.