Photosensitive composition
CA 1264022 C · Owner: Suzuki, Norihito · Inventors: Maeda, Yoshihiro; Goto, Kiyoshi; Suzuki, Norihito
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A photosensitive composition comprises: (a) a photosensitive diazo resin represented by the general formula (I):, (I), wherein R1, R2 and R3 each represents a hydrogen atom an, alkyl or alkoxy group, R represents a hydrogen atom an, alkyl or phenyl group, X represents PF6 or BF4 and n represents a number of 1 to 200, in which resins of the above formula in which n is at least 5 are present in an amount of more than 20 mol %, (b) an oleophilic high molecular compound containing a hydroxyl group and (c) a high molecular organic acid without hydroxyl group and in which the content of the ingredient (c) is from 1.5 to 30% by weight based on the solid matter in said composition.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted December 27, 1989. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended December 27, 2006.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.