Method of manufacturing a semiconductor device by vapour phase deposition using multiple inlet flow control
CA 1262294 C · Owner: N.V. Philips' Gloeilampenfabrieken · Inventors: Frijlink, Peter Michael
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Method of manufacturing a semiconductor device including the step of depositing from the vapour phase layers on a substrate. A method of manufacturing a semiconductor device including the step of depositing from the vapour phase layers on a substrate in the chamber of a reactor in which a vector gas and a reactant gas are introduced, characterized in that the vector gas and the reactant gas are introduced into the chamber of the reactor by means of a system of three coaxial tubes, the first of which (the inner tube) has a diameter smaller than that of the second tube (the intermediate tube), which in turn has a diameter smaller than that of the third tube (the outer tube), the first ends of …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted October 10, 1989. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended October 10, 2006.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
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Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.