Method for forming patterns and apparatus used for carrying out the same
CA 1260754 A · Owner: Fujitsu Limited · Inventors: Majima, Teiji; Watanabe, Hiromichi
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A method is disclosed of forming a fine pattern on a substrate, in which an etching mask pattern is formed on a layer of material of a pattern to be formed an, overlying layer is deposited on the pattern material layer and the mask pattern/ and thereafter the overlying, layer and the pattern material layer are etched by ion etching. This method makes it possible due to the, pattern-widening effect caused by the deposition of the overlying layer and by ion etching, to form a pattern having a gap smaller than 0.5 um or a contiguous-disk pattern having a period of 2 um or less by photolithography having a 1 um resolution. It is also possible to form a pattern adapted to enable an easy planing …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted September 26, 1989. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended September 26, 2006.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.