Mask-surrogate semiconductor process employing dopant-opaque region
CA 1253262 A · Owner: Advanced Power Technology, Inc. · Inventors: Hollinger, Theodore G.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A mask-defect-immune process for making semiconductor devices. The process features the creation of one or more surrogate masks in semiconductor wafer material per se thus to, eliminate the requirement that plural masks be used and that, plural mask alignments be performed. In all ways of practicing the invention, one surrogate mask is created in a dopant-opaque region.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted April 25, 1989. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended April 25, 2006.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.