Chemical vapor deposition apparatus
CA 1236970 A · Owner: Anicon, Inc. · Inventors: Campbell, Bryant A.; Manriquez, Ralph F.; Miller, Nicholas E.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
of the Invention, Chemical vapor deposition reaction chamber glassware includes an upper reaction chamber cover and a wafer boat support plate. A gas collector means has an upper edge supporting the wafer boat support, and the upper portion thereof communicates with gas flow openings in the wafer support plate for removal of spent CVD gases from the reaction chamber. Gas injectors enclosed within the gas collectors pass upwardly through the wafer support plate. Unique wafer boats of several types are supported on the wafer boat support.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted May 24, 1988. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended May 24, 2005.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.