Method and apparatus for fabricating devices with dc bias-controlled reactive ion etching
CA 1211867 A · Owner: American Telephone And Telegraph Company · Inventors: Vratny, Frederick; Tai, King L.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Abstract A method and apparatus for fabricating a device is disclosed, which involves a new reactive ion etching technique. Both a high etch rate and, for example a high, etch selectivity are simultaneously achieved with the inventive reactive ion etching technique by discharging an electrode of the reactive ion etching apparatus in response to a preselected criterion, e.g. a magnitude of a DC bias at said electrode which equals, or exceeds a preselected, value.
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted September 23, 1986. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended September 23, 2003.
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Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.