Photo and heat assisted chemical vapour deposition

Abstract From the Canadian patent

A process and apparatus for depositing a film from a gas comprising silane and germane involves introducing the gas to a deposition environment containing a substrate, heating the substrate, and irradiating the gas with radiation having a preselected energy spectrum such, that a silicon and germanium alloy film is deposited onto the substrate. In a preferred embodiment the energy, spectrum of the radiation is below or approximately equal to that required to photochemically decompose the gas. In another embodiment the gas is irradiated through a, transparent member exposed at a first surface thereof to the deposition environment, and a flow of substantially inert gaseous material is passed …