Ion implanted memory cells for high density ram
CA 1205574 A · Owner: Fairchild Camera And Instrument Corporation · Inventors: Berry, Robert L.; Ko, Wen-Chuang
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Wen C. Ko, Robert L. Berry, ABSTRACT, A semiconductor structure is fabricated using a process involving all ion implantation and using only five masks prior to metallization. A buried contact mask is used to form a buried contact layer (114) an isolation, mask is used to form grooves (130a 130b) in an epitaxial, layer of silicon (113) a self-aligned transistor mask is, used to form a mask (134a to 134e) to define the areas in which emitters (138a, 140b, 140c) bases (113 139) and, contact regions (140a) are to be formed a base exclusion, mask (135a,b) is provided to exclude certain impurities from being implanted into a region to be formed of one conductivity type, and a second exclusion …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted June 3, 1986. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended June 3, 2003.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.