Manufacturing method for a planar photodiode with hetero-structure
CA 1203877 A · Owner: Siemens Aktiengesellschaft · Inventors: Trommer, Reiner
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
In a method for manufacturing an avalanche photodiode with an epitaxial layer sequence on a carrier body the carrier body is not the, substrate for an epitaxy of the photodiode. One of the epitaxial layers is employed as a selectively etchable mask for generating a pn junction of the diode.
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted April 29, 1986. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended April 29, 2003.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.