Method and apparatus for captivating a substrate within a holder
CA 1202123 A · Owner: Motorola, Inc. · Inventors: Dworsky, Lawrence N.; Shanley, Charles W.; Whalin, Jeffery A.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A method of captivating a substrate within a. holder for photolithographic processing is shown. A substrate is placed within the aperture of a holder and is sandwiched into place by laminating it with layers of dry film photopolymer resist. Portions of the photopolymer resist are polymerized. Unpolymerized portions are washed away leaving retaining tabs of polymerized resist which hold the substrate within the holder for an etching or plating process.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted March 18, 1986. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended March 18, 2003.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.