Rapid rate reactive sputtering of metallic compounds
CA 1198085 A · Owner: Borg-Warner Corporation · Inventors: Sproul, William D.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A method of reactive sputtering of the nitride oxide or carbide of titanium or similar materials onto a substrate (11) from a target (21) of the pure metal in a chamber (12) utilizing an inert gas, such as argon wherein the deposition rate of the metallic compound approaches substantially the deposition rate of the pure metal. A reactive gas is introduced into the chamber adjacent to the target (21) at a constant flow and by a rapid pulsing wherein a valve is alternately opened and shut for very short time intervals.
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted December 17, 1985. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended December 17, 2002.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.