Step-and-repeat projection alignment and exposure system
CA 1181623 A · Owner: Optimetrix Corporation · Inventors: Phillips, Edward H.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
An alignment and exposure system is provided with a main stage for positioning a reference mark or a semiconductive wafer directly beneath a projection lens. The reference mark is mounted on the main stage by a substage permitting the reference mark to be positioned in alignment with the axes of motion of the main stage and in a plane parallel to and coincident with the image plane of the projection lens. Selected portions of a reticle disposed above the projection lens on another stage may be illuminated with either exposure or nonexposure light by a controllable light source unit. While employing the projection lens and a first objective lens unit to view images of portions of the …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted January 29, 1985. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended January 29, 2002.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.