Method for developing a cop resist used in x-ray lithography
CA 1136775 A · Owner: The Perkin-Elmer Corporation · Inventors: Buckley, William D.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Apparatus and method are provided for developing a COP resist used in x-ray lithography apparatus. The lithography apparatus uses an x-ray target made of tungsten and the apparatus is operated to generate the tungsten M-line, this line being at a wavelength which will be absorbed by the resist normally used in lithography. To develop the resist, which was initially designed for use in an electron beam lithography, a developing method is used in which an initial short development with a high concentration is first carried out followed by a longer full development, with a concentration which is approximately the lowest at which complete development will take place.
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted November 30, 1982. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended November 30, 1999.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
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Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.