Lithographic process and resulting article

Abstract From the Canadian patent

This invention relates to lithographic patterning, particularly in fabrication of integrated circuitry, which is based on the photoinduced migration of silver into germanium selenide or other glassy material of appropriate absorption cross section for a chosen actinic radiation. Resists which are negative-acting yield ? resolution attributed to initial introduction of the silver in chemically combined form chosen so as to result in formation of a silver compound w? a glass component with the compound serving as silver source. Removal of excess silver-containing material is engineered on the basis of the form of silver introduction and results in conversion to a water soluble form. The …