Polymeric composition having enhanced resistance to photodegradation
CA 1106523 A · Owner: Goodrich (B.F.) Company (The) · Inventors: Son, Pyong-Nae
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
An ultraviolet light sensitive polymer composition wherein resistance to photodegradation is enhanced by the addition thereto of a mixture containing at least one substituted decahydroquinoline compound and at least one UV absorbing compound selected from the group consisting of benzotriazoles, benzoates and nickel phenolate complexes. This invention is also directed to methods for enhancing the resistance of ultraviolet light sensitive polymers to photodegradation.
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted August 4, 1981. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended August 4, 1998.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.