Multiple electron beam exposure system
CA 1100237 A · Owner: Western Electric Company, Incorporated · Inventors: Pease, Roger F.W.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Abstract of the Disclosure, In an improved electron beam exposure system (EBES), a demagnified image of an array of illuminated apertures is focused and scanned over the surface of a resist-coated workpiece. A deflection unit is associated with the array of apertures to provide an independent blanking capability for each of the electron beams propagated through the aperture array. Such an EBES can be operated in a faster mode than a conventional system. In addition the electron dose delivered to each address position on the resist coating can be thereby selectively controlled.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted April 28, 1981. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended April 28, 1998.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.