Photosensitive block copolymer composition and elements
CA 1099435 A · Owner: E. I. Du Pont De Nemours And Company · Inventors: Chen, Gwendyline Y. Y. T.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Photosensitive compositions and elements made, therefrom, comprising a solvent-soluble thermoplastic, elastomeric, block copolymer a nongaseous ethylenically, unsaturated compound and an addition polymerization, initiator activatable by actinic light are useful in preparing printing plates, particularly flexographic printing plates, and other relief images.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted April 14, 1981. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended April 14, 1998.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.