Semiconductor etching process
CA 1097434 A · Owner: N.V. Philips Gloeilampenfabrieken · Inventors: Neukomm, Hans-Rudolf
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The invention relates toa method of plasma etching a body in which a surface of the body is covered with a photolacquer mask. According to the invention the method is characterized in that the photolacquer mask to be provided exceeds the desired dimensions of the etching pattern to be formed and furthermore that the method is carried out so that the photolacquer mask is etched more rapidly than the body. An etchin, profile having included sides is obtained. -13-
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted March 10, 1981. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended March 10, 1998.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.