Photosensitive composition
CA 1094379 A · Owner: Hoechst Aktiengesellschaft · Inventors: Stahlhofen, Paul
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Abstract of the Disclosure This invention relates to a photosensitive composition comprising an ester or an amide of an o-naphthoquinone diazide sulfonic or carboxylic acid and, based on the amount of this compound about 1, to 50 per cent by weight of an organic dye capable of salt formation and about 5 to 75 per cent by weight of a photosensitive halogen-containing compound which releases acid upon exposure to light and having one of the genera!! formulae I or II, I , II in which Ra is an aryl group or a heterocyclic group which may be substituted, Rb is a trihaloalkyl group or a trihaloalkenyl group having from 1 to 3 carbon atoms, and n is 1, 2 or 3.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted January 27, 1981. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended January 27, 1998.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.