Mask structures for x-ray lithography
CA 1092255 A · Owner: Western Electric Company, Incorporated · Inventors: Maldonado, Juan R.; Maydan, Dan; Somekh, Sasson R.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Abstract of the Disclosure The present invention relates to a mask structure for x-ray lithography. The mask structure is comprised of a dimensionally stable support member and a substrate comprising a x-ray-transparent film stretched over and bonded to the support member. Stress-compensating constituents are provided for forming a very-low-stress x-rayabsorp pattern on the substrate. The invention also includes a method for producing a mask structure for x-ray lithography. The method is comprised of stretching an x-ray-transparent film over a dimensionally stable support member and bonding the film to the member. The steps further include depositing an x-ray-absorptive layer on the film. …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted December 23, 1980. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended December 23, 1997.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.