Positive resists containing dimethylglutarimide units
CA 1072243 A · Owner: International Business Machines Corporation · Inventors: Bargon, Joachim; Gipstein, Edward; Hiraoka, Hiroyuki
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Abstract of the Disclosure, A process for forming an image with a positive resist using a polymer containing dimethylglutarimide units. The polymer is sensitive to both electron beam and light radiation has a high glass transition temperature a high temperature, resistance, and is capable of very fine spatial resolution very suitable for micro circuitry processings.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted February 19, 1980. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended February 19, 1997.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.