Photoresist composition containing orthoquinone or naphthoquinone diazide and polyamic acid condensation product
CA 1063416 A · Owner: G A F Corporation · Inventors: Mcinerney, Eugene F.; Loprest, Frank J.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A positive working thermally stable photoresist, comprising a light-sensitive orthoquinone diazide or naphthoquinone diazide and a polyamic acid condensation product of an aromatic dianhydride and an aromatic di-primary amine and, a support carrying a layer of said photoresist. After exposure the image is developed in the layer with an alkaline aqueous developer and is unaffected by heating to 500°C thus allowing, the use of the photoresist layer for plasma and sputter-etching as well as ion implantation.
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Granted October 2, 1979. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended October 2, 1996.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.