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Expired Canadian patentCanada

Process for preparing photosensitive polymer

CA 1046683 A · Owner: Mitsubishi Chemical Industries Ltd. · Inventors: Takahashi, Yoshihiro; Torige, Kazuo; Eguchi, Chihiro

CIPO record

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Abstract From the Canadian patent

The present invention provides a process for preparing a photosensitive polymer by reacting a polymer having an active halogen atom with an .alpha..beta.-unsturated carboxylic acid having the formula (I). Ar-(YC = CX)n - ? - OH (I) wherein X and Y reprerent hydrogen atom halogen atom, cyano, group or nitro group; Ar represents an aryl group which can be substituted with a nitro or cyano group and m is 1 or 2 in an aprotic, polar solvent, which is characterized in that the reaction is conducted in the presence of a bicyclic amidine having the formula (II), wherein R1 represents C1-11 alkylene group which can be substitutcd by a lower alkyl group and R2 represents propylene group which can be …

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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.

Why it's free to use

  • Granted January 16, 1979. A Canadian patent filed before October 1, 1989 lasted 17 years from grant, so its term ended January 16, 1996.
  • We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Filed—
GrantedJanuary 16, 1979
Term endedJanuary 16, 1996
Patent numberCA 1046683 A
Classification (IPC)C08G65/32 +2 more

Timeline

Timeline From CIPO dates

198019821984198619881990199219941996Patent grantedJan 16, 1979Term endedJan 16, 1996

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Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.