Method for producing aluminum holographic masters

Abstract From the Canadian patent

A master for replicating surface relief holograms is prepared by depositing a photoresist on the surface of an amorphous aluminum substrate exposing the, photorosist to an interference pattern developing the, photoresist to record the interference pattern as a surface relief pattern, transferring the surface relief pattern onto the surface of the aluminum substrate removing the remaining photoresist, and anodizing the aluminum surface. This method is particularly useful in making masters for surface relief focused image holograms whose surface dimensions are in the order of one micron or less.